COMPOSITION AND CHEMICAL-STATE OF TITANIUM NITRIDE FILMS OBTAINED BY DIFFERENT METHODS

Titanium nitride films were obtained by three methods: ion-assisted de position, deposition using the cathode spot arc discharge system (ion plating) and deposition using a planar magnetron. The resulting films were analysed by X-ray photoelectron spectroscopy and Rutherford backs cattering spectrometry. Depending on the preparation conditions, the f ilms were shown to have different composition and different colour (go lden, copper-like, or blue). The golden-coloured films, formed by magn etron sputtering, comprise about 95% titanium nitride and about 5% tit anium oxynitride. The other samples contain less titanium nitride, esp ecially the blue-coloured films which contain only about 55% titanium nitride, 35% titanium oxynitrides and 10% titanium oxides.