IN-SITU MEASUREMENT OF ION-IMPLANTATION EFFECTS ON YBCO SUPERCONDUCTING FILMS

Citation
Xg. Fan et al., IN-SITU MEASUREMENT OF ION-IMPLANTATION EFFECTS ON YBCO SUPERCONDUCTING FILMS, Surface & coatings technology, 70(1), 1994, pp. 33-36
Citations number
9
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
70
Issue
1
Year of publication
1994
Pages
33 - 36
Database
ISI
SICI code
0257-8972(1994)70:1<33:IMOIEO>2.0.ZU;2-B
Abstract
Thin superconducting films of YBa2Cu3O7 have been deposited on SrTiO3 substrates using a home-made hollow cathode magnetron sputtering syste m. The samples were placed on a variable-temperature target stage of a 200 keV implanter and then bombarded by O+ to different doses. The el ectrical resistance of the samples and its dependence on both ion dose and temperature were measured in situ. Our experimental results revea l that the resistive behavior is extremely sensitive to ion dose, and the ion damage has a strong effect on the transport properties of thes e films.