Porous silicon formed by anodization of a p-type silicon substrate is
characterized by a distribution of crystallites with diameters smaller
than about 100 Angstrom. The corresponding size distributions obtaine
d from Raman measurements show distinct peaks which are explained for
the first time by the tunneling of holes through crystallite barriers
during the formation process of porous silicon. The theoretical descri
ption is based on quantum mechanical calculations of the tunneling pro
bability of the holes through small crystallites into the electrolyte.
This tunneling probability shows oscillations as a function of crysta
llite size which are comparable to the structures observed in the size
distributions, The calculations presented provide a deeper understand
ing of these size distributions and of the basic formation mechanism o
f porous silicon.