THE MECHANISM OF FORMATION OF HEXAFLUOROPROPYLENE OXIDE UPON RADIATION-INDUCED OXIDATION OF HEXAFLUOROPROPYLENE

Citation
Vv. Shapovalov et Va. Poluektov, THE MECHANISM OF FORMATION OF HEXAFLUOROPROPYLENE OXIDE UPON RADIATION-INDUCED OXIDATION OF HEXAFLUOROPROPYLENE, High energy chemistry, 29(1), 1995, pp. 24-25
Citations number
9
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00181439
Volume
29
Issue
1
Year of publication
1995
Pages
24 - 25
Database
ISI
SICI code
0018-1439(1995)29:1<24:TMOFOH>2.0.ZU;2-H
Abstract
Dependence of the formation rate of hexafluoropropylene oxide on oxyge n pressure at 273 and 303 K was studied. It was shown that this depend ence is almost inversely proportional. Experimental data confirm the c onclusion that the epoxy is formed not in the commonly known reaction R-O-O-C3F6. --> RO. + C3F6O, but rather, in the reaction R-O-C3F6. --> R. + C3F6O.