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ITA
ENG
EFFECT OF POWER ON INTERFACE AND ELECTRICAL-PROPERTIES OF SIO2-FILMS PRODUCED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
Authors
LANDHEER D
XU DX
TAO Y
SPROULE GI
Citation
D. Landheer et al., EFFECT OF POWER ON INTERFACE AND ELECTRICAL-PROPERTIES OF SIO2-FILMS PRODUCED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Journal of applied physics, 77(4), 1995, pp. 1600-1606
Citations number
28
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics
→
ACNP
ISSN journal
00218979
Volume
77
Issue
4
Year of publication
1995
Pages
1600 - 1606
Database
ISI
SICI code
0021-8979(1995)77:4<1600:EOPOIA>2.0.ZU;2-X