EFFECT OF POWER ON INTERFACE AND ELECTRICAL-PROPERTIES OF SIO2-FILMS PRODUCED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

Citation
D. Landheer et al., EFFECT OF POWER ON INTERFACE AND ELECTRICAL-PROPERTIES OF SIO2-FILMS PRODUCED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Journal of applied physics, 77(4), 1995, pp. 1600-1606
Citations number
28
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
77
Issue
4
Year of publication
1995
Pages
1600 - 1606
Database
ISI
SICI code
0021-8979(1995)77:4<1600:EOPOIA>2.0.ZU;2-X