Vv. Sleptsov et al., CAPABILITIES OF PLASMA BEAM DISCHARGE FOR THE FORMATION OF DIAMOND-LIKE CARBON-FILMS, DIAMOND AND RELATED MATERIALS, 4(2), 1995, pp. 120-121
In this paper we describe the system developed on the basis of plasma
beam discharge producing high density plasma (10(10)-10(13) cm(-3)). T
he system allows the formation of charged-particle flows (10-100 mA cm
(-2)) at an energy of 60-200 eV onto a treated surface. We have presen
ted results obtained for the diamond-like carbon films produced by thi
s system. It was shown that the him resistivity increased from 10(8) t
o 10(12) Omega cm, and the optical band gap from 2.4 to 3.2 eV, depend
ing on the type of charged particles (ions or electrons) incident on t
he grown layer surface. The addition of oxygen (up to 20%) to the orig
inal working gas permits the deposition of hard transparent diamond-li
ke carbon films with a band gap of 3.5 eV.