CAPABILITIES OF PLASMA BEAM DISCHARGE FOR THE FORMATION OF DIAMOND-LIKE CARBON-FILMS

In this paper we describe the system developed on the basis of plasma beam discharge producing high density plasma (10(10)-10(13) cm(-3)). T he system allows the formation of charged-particle flows (10-100 mA cm (-2)) at an energy of 60-200 eV onto a treated surface. We have presen ted results obtained for the diamond-like carbon films produced by thi s system. It was shown that the him resistivity increased from 10(8) t o 10(12) Omega cm, and the optical band gap from 2.4 to 3.2 eV, depend ing on the type of charged particles (ions or electrons) incident on t he grown layer surface. The addition of oxygen (up to 20%) to the orig inal working gas permits the deposition of hard transparent diamond-li ke carbon films with a band gap of 3.5 eV.