FREQUENCY-SHIFT OF THE SI-H VIBRATIONAL-MODES ON ERBIUM SILICIDE MEASURED BY HREELS

Citation
T. Angot et al., FREQUENCY-SHIFT OF THE SI-H VIBRATIONAL-MODES ON ERBIUM SILICIDE MEASURED BY HREELS, Surface science, 368, 1996, pp. 190-195
Citations number
32
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
368
Year of publication
1996
Pages
190 - 195
Database
ISI
SICI code
0039-6028(1996)368:<190:FOTSVO>2.0.ZU;2-K
Abstract
Hydrogen adsorption on two-dimensional (2D) ErSi2/Si(111) as well as o n a 300 Angstrom thick ErSi1.7(0001) film on Si(lll) has been studied by HREELS. Both surfaces exhibit the characteristic monohydride Si-H b ending and stretching modes confirming the structural model of a silic ide terminated by a buckled silicon plane similar to the ideal Si(111) termination. Nevertheless when compared to the Si(111)-delta(7x7)H or Si(001)-(2x1)H surfaces, these modes are found to be shifted towards lower energies: approximately 25 cm(-1) for the 2D silicide and 65 cm( -1) for the thick silicide. This provides an example of a marked chang e in the Si-H surface vibration frequencies induced by a modification in the third atomic layer below the surface i.e. in the third coordina tion shell of the adsorbate. The shift is interpreted as a weaker Si-H force constant on the silicide apparently related to a small reductio n in bond order because of electron donation from the Er layer underne ath.