Hydrogen adsorption on two-dimensional (2D) ErSi2/Si(111) as well as o
n a 300 Angstrom thick ErSi1.7(0001) film on Si(lll) has been studied
by HREELS. Both surfaces exhibit the characteristic monohydride Si-H b
ending and stretching modes confirming the structural model of a silic
ide terminated by a buckled silicon plane similar to the ideal Si(111)
termination. Nevertheless when compared to the Si(111)-delta(7x7)H or
Si(001)-(2x1)H surfaces, these modes are found to be shifted towards
lower energies: approximately 25 cm(-1) for the 2D silicide and 65 cm(
-1) for the thick silicide. This provides an example of a marked chang
e in the Si-H surface vibration frequencies induced by a modification
in the third atomic layer below the surface i.e. in the third coordina
tion shell of the adsorbate. The shift is interpreted as a weaker Si-H
force constant on the silicide apparently related to a small reductio
n in bond order because of electron donation from the Er layer underne
ath.