PHOTO-ASSISTED DIRECT WRITING OF CONDUCTING ALUMINUM

Authors
HWANG SD BYUN DJ GLASS JA ROBERTSON B SPENCER JT DATTA S DOWBEN PA
Citation
Sd. Hwang et al., PHOTO-ASSISTED DIRECT WRITING OF CONDUCTING ALUMINUM, Materials science & engineering. B, Solid-state materials for advanced technology, 30(1), 1995, pp. 5-8
Citations number
24
Categorie Soggetti
Material Science","Physics, Condensed Matter
Journal title
Materials science & engineering. B, Solid-state materials for advanced technology → ACNP
ISSN journal
09215107
Volume
30
Issue
1
Year of publication
1995
Pages
5 - 8
Database
ISI
SICI code
0921-5107(1995)30:1<5:PDWOCA>2.0.ZU;2-T
Abstract
We have succeeded in selective area deposition of aluminum films by ul traviolet photolytic decomposition of the orqanometallic complex trime thylamine alane, TMAA-AlH3(N(CH3)(3))(2). Both ultraviolet and visible light successfully photolysed the alane adduct and resulted in select ive area deposition. The light sources exhibited different laser fragm entation mass spectra, suggesting somewhat different decomposition pat hways.