P-type Hg1-xCdxTe layers were growth at PRINSO (Programa de Investigac
iones en Solidos) by ISOVPE (Isothermal Vapor Phase Epitaxy) technique
. Argon implantation was carried our to create a junction. Backscatter
ing Spectrometry, Channeling and electrical measurements were performe
d before and after implantation. Diodes were manufactured and their ph
otovoltaic properties were evaluated by measuring I-V characteristics
and the spectral response at 77 K.