MEASURING AND MODELING THE PROXIMITY EFFECT IN DIRECT-WRITE ELECTRON-BEAM LITHOGRAPHY KINOFORMS

The proximity effect in successively developed direct-write electron-b eam lithography gratings is measured. The grating relief shapes are ob tained from the measured power in several of the gratings' diffraction orders. Describing the proximity effect by a convolution with a doubl e Gaussian point-spread function, we determine the parameters of the p oint-spread function. The writing part of the point-spread function is found to increase significantly with increasing development time, the background part much less.