ENHANCED BACKSCATTERING DUE TO TOTAL INTERNAL-REFLECTION AT A DIELECTRIC-AIR INTERFACE

Citation
Re. Luna et al., ENHANCED BACKSCATTERING DUE TO TOTAL INTERNAL-REFLECTION AT A DIELECTRIC-AIR INTERFACE, J. mod. opt., 42(2), 1995, pp. 257-269
Citations number
18
Categorie Soggetti
Optics
Journal title
ISSN journal
09500340
Volume
42
Issue
2
Year of publication
1995
Pages
257 - 269
Database
ISI
SICI code
0950-0340(1995)42:2<257:EBDTTI>2.0.ZU;2-T
Abstract
We report the observation of enhanced backscattering in the scattering of light from a photoresist film with a one-dimensional randomly roug h interface deposited on a flat parallel glass plate. The random inter face is illuminated from the photoresist side, entering the sample thr ough the glass plate. Angular scattering measurements for this sample are presented and compared with results obtained numerically using two approximate models to describe the interaction between the light and the sample. The observed backscattering enhancement is believed to be due to multiple scattering processes at the photoresist-air interface, where total internal reflection can take place.