ANISOTROPIC ETCHING OF SILICON IN RUBIDIUM HYDROXIDE (VOL 141, PG 2493, 1994)

Authors
WANG T SURVE S HESKETH PJ
Citation
T. Wang et al., ANISOTROPIC ETCHING OF SILICON IN RUBIDIUM HYDROXIDE (VOL 141, PG 2493, 1994), Journal of the Electrochemical Society, 142(3), 1995, pp. 46-46
Citations number
1
Categorie Soggetti
Electrochemistry
Journal title
Journal of the Electrochemical Society → ACNP
ISSN journal
00134651
Volume
142
Issue
3
Year of publication
1995
Pages
46 - 46
Database
ISI
SICI code
0013-4651(1995)142:3<46:AEOSIR>2.0.ZU;2-#