Da. Tryk et al., IN-SITU X-RAY-ABSORPTION FINE-STRUCTURE MEASUREMENTS OF LANI5 ELECTRODES IN ALKALINE ELECTROLYTES, Journal of the Electrochemical Society, 142(3), 1995, pp. 824-828
In situ Ni K-edge and La L(m)-edge x-ray absorption fine structure (XA
FS) measurements of LaNi5 electrodes supported on hydrophobic carbon b
lack-polytetrafluoroethylene (PTFE) layers were carried out in strongl
y alkaline electrolytes as a function of the state of charge. The Ni K
-edge x-ray absorption near-edge structure (XANES) for the material in
the discharged (and uncharged) and charged states were essentially id
entical to those reported earlier for crystalline LaNi5 before and aft
er exposure to gas-phase hydrogen, respectively. The Ni K-edge extende
d x-ray absorption fine structure (EXAFS) analysis of the most promine
nt shell yielded average Ni-Ni nearest neighbor distances of 2.52 +/-
0.02 Angstrom for the charged compared to 2.47 +/- 0.02 Angstrom for t
he discharged and uncharged electrodes. For the La L(m)-edge XANES, th
e white line was found to be significantly more intense for the charge
d than for the uncharged LaNi5, an effect consistent with an increase
in the density of empty d-like states just above the Fermi level on hy
drogen injection.