M. Bounoughaz et al., BEHAVIOR OF COPPER ANODES CONTAINING OXYGEN, SILVER AND SELENIUM IMPURITIES DURING ELECTRO-REFINING, Canadian metallurgical quarterly, 34(1), 1995, pp. 21-26
The anodic passivation of copper anodes containing oxygen, silver and/
or selenium as impurities has been investigated in sulphuric acid at 6
5.0+/-0.2 degrees C by voltammetric, chronopotentiometric acid impedan
ce techniques. A stationary electrode was used at a slow potential sca
n rate for the voltammetric technique. The voltammograms of the pure c
opper and alloy copper anodes exhibit three characteristic regions: th
e active dissolution, region I, the dissolution and precipitation, reg
ion II, and a current plateau passivation, region III. Electrochemical
results obtained in this study show that passivation of copper anodes
increases when impurities are added in the following order: Cu --> Cu
-O --> Cu-Ag --> Cu-Se --> Cu-Ag-Se. X-ray diffraction results show th
at the anode surfaces, in the passive region, were covered by copper p
owder, silver and selenides.