NANOSCALE PATTERNING USING NANOCHANNEL GLASS REPLICA FILMS

Nanochannel glass replica films have been used as masks for the in-sit u parallel patterning of GaAs/AlGaAs single quantum wells during growt h by MBE. Quantum well pyramids with lateral dimensions as small as 50 0 nm exhibit low temperature (5 K) photoluminescence associated with t he 50 Angstrom well thickness of the structure. By control of the repl ica membrane properties and deposition conditions, we demonstrate that it may be possible to reduce the lateral dimensions of layered struct ures beyond what would normally be expected from the starting aperture s. (C) 1996 Academic Press Limited