LITHOGRAPHY FOR MICROELECTRONICS

Synchrotron-radiation-based X-ray lithography has been studied for mo re than 15 years as an alternative to conventional UV lithography. Sto rage rings, beamlines, X-ray masks, X-ray steppers and other component s have been developed and optimized for X-ray lithography. Compact rin gs have therefore become commercially available, beamlines have been o ptimized for practical use, and test devices can now be fabricated bec ause of improved total accuracy in the X-ray masks and steppers. This report discusses the status of key techniques involving synchrotron ra diation sources, beamlines, X-ray masks, and X-ray steppers.