ANALYSIS OF GRATING FORMATION WITH EXCIMER-LASER IRRADIATED PHASE MASKS

Excimer laser irradiated phase masks provide a convenient and effectiv e method for writing micron-scale gratings for optoelectronic device a pplications. Here we analyze the interference field produced by a peri odic mask and assess the near-field energy density and fluence distrib ution for varying degrees of order content when exposed using an excim er laser with finite spatial and temporal coherence. Results are compa red with experimental findings for gratings produced on ablated polyme rs and in optical fibres.