MAGNETIZATION AND MICROSTRUCTURE OF NI FILMS PREPARED BY DC MAGNETRONSPUTTERING

Authors
HANSON M MARGITIN A STJERNA B
Citation
M. Hanson et al., MAGNETIZATION AND MICROSTRUCTURE OF NI FILMS PREPARED BY DC MAGNETRONSPUTTERING, Journal of magnetism and magnetic materials, 144, 1995, pp. 701-702
Citations number
6
Categorie Soggetti
Material Science","Physics, Condensed Matter
Journal title
Journal of magnetism and magnetic materials → ACNP
ISSN journal
03048853
Volume
144
Year of publication
1995
Part
1
Pages
701 - 702
Database
ISI
SICI code
0304-8853(1995)144:<701:MAMONF>2.0.ZU;2-W
Abstract
We prepared Ni films, about 50 nm thick, by dc magnetron sputtering. F ilms deposited at room temperature have saturation magnetizations, M(s ), significantly reduced below the value of bulk Ni. M(s) and the coer civity vary with the substrate temperature. This is interpreted as due to changes in the microstructure of the films.