The realization of a ceramic protector covering a subregion of a subst
rate and using chemical vapor deposition (cvd) techniques needs the te
mperature field in the deposition zone to be controlled. A feedback co
ntrol of this temperature is based on the knowledge of the temperature
in the considered subregion. The difficulty occurs because measuremen
ts can only be obtained out of the deposition zone. The purpose of thi
s paper is to give an original approach for the reconstruction of the
state in the deposition subregion.