THE PRECISION-IMPLANT-9500 PLASMA FLOOD SYSTEM - THE ADVANCED SOLUTION TO WAFER CHARGING

An advanced wafer charge neutralization system based on plasma flood t echnique has been developed to achieve an ideal voltage control on the wafer surface during implantation. The system makes use of the ''self -regulating'' characteristics of low energy plasma electrons that clam p the surface potential within a few volts. Low energy electrons are g enerated in an are discharge plasma chamber combined with an accel/dec el extraction mechanism and are transported to wafers through a guide tube that confines a dense plasma by using a combination of electrosta tic suppression and a magnetic cusp field. The system has been equippe d as standard on the Precision Implant 9500 and shown full yield on va rious charge sensitive devices.