D. Mao et al., IMPROVED EFFICIENCY AND STABILITY OF SILICON PHOTOCATHODES BY ELECTROCHEMICAL ETCHING, Journal of physical chemistry, 99(11), 1995, pp. 3643-3647
The photoelectrochemical behavior of electrochemically etched Si catho
des contacting a nonaqueous redox electrolyte is described. The electr
ochemically etched Si electrodes exhibit higher energy conversion effi
ciencies than Si electrodes chemically treated in HF solution. The por
ous Si layer formed during electrochemical etching plays an important
role in suppressing surface recombination and stabilizing the Si elect
rodes against photocorrosion.