Ch. Mueller et al., YBA2CU3O7-X FILMS ON OFF-AXIS Y-ZRO2 SUBSTRATES USING Y-ZRO2 OR Y2O3 BARRIER LAYERS, Journal of materials research, 10(4), 1995, pp. 810-816
YBa2CU3O7-x (YBCO) and barrier layer films were deposited on single-cr
ystal (Y2O3)(0.09)(ZrO2)(0.91) substrates cut between 3.6 and 35.7 deg
rees off-axis from the (001) planes. The barrier layers were (Y2O3)(0.
065)(Y-ZrO2)(0.935)(Y-ZrO2), Y2O3, Of multilayered structures of Y-ZrO
2 and Y2O3. X-ray diffraction showed that the Y-ZrO2 and Y2O3 barrier
layers generally grew epitaxially on the off-axis substrates, with the
(001) barrier layer film planes being parallel to those of the substr
ate, and the [100] directions being parallel. YBCO films deposited on
Y2O3 barrier layers also showed epitaxy with the YBCO (001) planes bei
ng nearly parallel to the substrate (001) planes, even for miscuts up
to 35.7 degrees. In contrast, the (001) planes of YBCO films deposited
on Y-ZrO2 barrier layers were almost parallel to the substrate surfac
e, not the (001) substrate planes. However, YBCO films on Y-ZrO2 films
maintained particular in-plane epitaxial orientations with respect to
the substrate. The YBCO full-width at half-maximum (FWHM) x-ray peaks
were slightly narrower (0.8 degrees) on Y2O3 barrier layers than on Y
-ZrO2 layers (1.3 degrees). The electrical resistivity versus temperat
ure behavior of the YBCO/Y2O3 films was consistent with increased,grai
n boundary scattering as the degree of substrate miscut increased, whe
reas YBCO/Y-ZrO2 films' resistivities showed less sensitivity to subst
rate miscut, consistent with the loss of epitaxy.