DOPANT INCORPORATION DURING EPITAXIAL-GROWTH OF A MULTICOMPONENT OXIDE THIN-FILM FROM VAPOR-PHASE - A CASE-STUDY OF FE YBA2CU3O(7-DELTA) SYSTEM/

Authors
OGALE SB TAKEUCHI I RAJESWARI M GREENE RL VENKATESAN T CHOUGHULE DD
Citation
Sb. Ogale et al., DOPANT INCORPORATION DURING EPITAXIAL-GROWTH OF A MULTICOMPONENT OXIDE THIN-FILM FROM VAPOR-PHASE - A CASE-STUDY OF FE YBA2CU3O(7-DELTA) SYSTEM/, Applied physics letters, 66(13), 1995, pp. 1674-1676
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
66
Issue
13
Year of publication
1995
Pages
1674 - 1676
Database
ISI
SICI code
0003-6951(1995)66:13<1674:DIDEOA>2.0.ZU;2-B