DETERMINATION OF HELIUM PRESENCE IN THE MASK WAFER GAP OF X-RAY-LITHOGRAPHY STEPPERS

Authors
MALDONADO JR DELLAGUARDIA R BABICH E
Citation
Jr. Maldonado et al., DETERMINATION OF HELIUM PRESENCE IN THE MASK WAFER GAP OF X-RAY-LITHOGRAPHY STEPPERS, Microelectronic engineering, 27(1-4), 1995, pp. 303-306
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
27
Issue
1-4
Year of publication
1995
Pages
303 - 306
Database
ISI
SICI code
0167-9317(1995)27:1-4<303:DOHPIT>2.0.ZU;2-A
Abstract
This paper describes a technique to determine the presence and uniform ity of Helium in the mask/wafer gap of x-ray lithography steppers by u tilizing the oxygen sensitive resist polychlorostyrene (PSC). Results obtained at the IBM Advanced Lithography Facility using a SUSS stepper and the HELIOS superconducting synchrotron storage ring are presented .