SIMULATION OF INFLUENCE OF PARTICLES ON PHOTORESIST FILMS FOR LITHOGRAPHY

Citation
M. Kamoshida et al., SIMULATION OF INFLUENCE OF PARTICLES ON PHOTORESIST FILMS FOR LITHOGRAPHY, Journal of applied physics, 77(6), 1995, pp. 2791-2795
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
77
Issue
6
Year of publication
1995
Pages
2791 - 2795
Database
ISI
SICI code
0021-8979(1995)77:6<2791:SOIOPO>2.0.ZU;2-D