MODELING OF SELF-LIMITING LASER-ABLATION OF ROUGH SURFACES - APPLICATION TO THE POLISHING OF DIAMOND FILMS

Citation
Vn. Tokarev et al., MODELING OF SELF-LIMITING LASER-ABLATION OF ROUGH SURFACES - APPLICATION TO THE POLISHING OF DIAMOND FILMS, DIAMOND AND RELATED MATERIALS, 4(3), 1995, pp. 169-176
Citations number
27
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
4
Issue
3
Year of publication
1995
Pages
169 - 176
Database
ISI
SICI code
0925-9635(1995)4:3<169:MOSLOR>2.0.ZU;2-3
Abstract
We present a theoretical model for the interaction of excimer laser ra diation with rough polycrystalline CVD diamond films, showing the infl uence of angle of incidence, irradiation intensity and number of laser pulses. A new regime of laser treatment self-limiting laser ablation - was found, which allows faceted films to be smoothed without wastefu l ablation of the bulk. Multipulse XeCl laser (308 nm) irradiation of our diamond films, grown on silicon wafers, confirms that such polishi ng is accomplished.