A NEW APPARATUS FOR MEASURING PARTICLE SIZES OF THE ORDER OF NANOMETER (2ND REPORT) - EVALUATION OF MEASURING SYSTEM BY USING STANDARD PARTICLES

This paper deals with the development of a new method for measuring pa rticle sizes of nm order on the raw silicon(Si) wafers by using a ligh t-scattering method with Ar+ laser. In this study, the sample models t o be measured were made by adhering the standard particles, of which t he particle diameter is known, on the surfaces of si wafers. Using the developed measuring system for the sample, the measurement of particl e diameter was attempted to evaluate this measuring method. It was con firmed that this measuring method had an ability to detect the diamete r of standard fine particles with relatively high accuracy. According to this, it was able to be verified that this measuring method could n ondestructively measure the particle diameter in nm order.