KINETICS OF EPITAXIAL-GROWTH AND ROUGHENING

Authors
FAMILY F AMAR JG
Citation
F. Family et Jg. Amar, KINETICS OF EPITAXIAL-GROWTH AND ROUGHENING, Materials science & engineering. B, Solid-state materials for advanced technology, 30(2-3), 1995, pp. 149-166
Citations number
67
Categorie Soggetti
Material Science","Physics, Condensed Matter
Journal title
Materials science & engineering. B, Solid-state materials for advanced technology → ACNP
ISSN journal
09215107
Volume
30
Issue
2-3
Year of publication
1995
Pages
149 - 166
Database
ISI
SICI code
0921-5107(1995)30:2-3<149:KOEAR>2.0.ZU;2-0
Abstract
We review some recent results on epitaxial growth and surface rougheni ng. Particular emphasis is placed on the concept of the critical islan d size in submonolayer growth and on the existence of scaling in both the submonolayer and multilayer growth regimes. The use of scaling ide as as well as Monte Carlo simulations and continuum equations is shown to be effective in understanding experimental results for submonolaye r growth and surface roughening.