PRESSURE AS A PROBE OF DEEP LEVELS AND DEFECTS IN SEMICONDUCTORS - ANTISITES AND OXYGEN CENTERS IN GAAS

Citation
Ga. Samara et al., PRESSURE AS A PROBE OF DEEP LEVELS AND DEFECTS IN SEMICONDUCTORS - ANTISITES AND OXYGEN CENTERS IN GAAS, Journal of physics and chemistry of solids, 56(3-4), 1995, pp. 625-629
Citations number
16
Categorie Soggetti
Physics, Condensed Matter",Chemistry
ISSN journal
00223697
Volume
56
Issue
3-4
Year of publication
1995
Pages
625 - 629
Database
ISI
SICI code
0022-3697(1995)56:3-4<625:PAAPOD>2.0.ZU;2-7
Abstract
The effects of temperature and hydrostatic pressure on the electron th ermal emission rates and capture cross-sections of EL2 and EL3 in GaAs and on the conductivity of Sb-doped GaAs were studied. The results yi elded the pressure dependences of the energies of the associated deep levels, allowed evaluation of the breathing mode lattice relaxations a ccompanying carrier emission or capture by these levels and revealed t rends which lead to new insights. The results are discussed in terms o f models for the responsible defects.