MODEL OF ETCHING PROFILES FOR ION ENERGY FLUX DEPENDENT ETCH RATES INA COLLISIONLESS PLASMA SHEATH

Authors
ABRAHAMSHRAUNER B WANG CD
Citation
B. Abrahamshrauner et Cd. Wang, MODEL OF ETCHING PROFILES FOR ION ENERGY FLUX DEPENDENT ETCH RATES INA COLLISIONLESS PLASMA SHEATH, Journal of applied physics, 77(7), 1995, pp. 3445-3449
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
77
Issue
7
Year of publication
1995
Pages
3445 - 3449
Database
ISI
SICI code
0021-8979(1995)77:7<3445:MOEPFI>2.0.ZU;2-J