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ITA
ENG
KINETIC OF THE GROWTH OF CHEMICALLY ETCHED POROUS SILICON
Authors
DIFRANCIA G
CITARELLA A
Citation
G. Difrancia et A. Citarella, KINETIC OF THE GROWTH OF CHEMICALLY ETCHED POROUS SILICON, Journal of applied physics, 77(7), 1995, pp. 3549-3551
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics
→
ACNP
ISSN journal
00218979
Volume
77
Issue
7
Year of publication
1995
Pages
3549 - 3551
Database
ISI
SICI code
0021-8979(1995)77:7<3549:KOTGOC>2.0.ZU;2-0