2-D ANALYTIC MODEL FOR INDUCTIVELY-COUPLED PLASMA SOURCES .2. EFFECTSOF 2-D COUPLED DAMPING AND THEIR APPLICATIONS

In the preceding paper, we developed the electromagnetic model and ana lyzed the plasma kinetic behavior for the recently developed inductive ly coupled plasma sources (ICPS). The analytic forms demonstrated that the induced RF wave in ICPS is primarily dampened by a collisionless dissipation mechanism. In this paper, the 2-D coupled damping effect i s further discussed. A criterion is given to describe the magnitude of coupled damping relative to collisions. The numerical integrals show that the coupled damping is obvious only as the RF phase velocity is c lose to plasma thermovelocity. The electron velocity distribution func tion was calculated for different cases. Also analyzed were the geomet ry and frequency effects. It was found that appropriately adjusting th e reactor height and coil current frequency could strengthen the coupl ed damping effect so as to benefit extracting the energy from the indu ced RF wave to the plasmas.