TECHNIQUE TO SUPPRESS DISLOCATION FORMATION DURING HIGH-DOSE OXYGEN IMPLANTATION OF SI

Authors
HOLLAND OW THOMAS DK ZHOU DS
Citation
Ow. Holland et al., TECHNIQUE TO SUPPRESS DISLOCATION FORMATION DURING HIGH-DOSE OXYGEN IMPLANTATION OF SI, Applied physics letters, 66(15), 1995, pp. 1892-1894
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
66
Issue
15
Year of publication
1995
Pages
1892 - 1894
Database
ISI
SICI code
0003-6951(1995)66:15<1892:TTSDFD>2.0.ZU;2-C