PARTICLE DETACHMENT MECHANISMS FROM ROUGH SURFACES UNDER SUBSTRATE ACCELERATION

Particle removal mechanisms due to an accelerating substrate from roug h surfaces are studied. The rough surface is modeled by asperities all of the same radius of curvature and with heights following a Gaussian distribution. The Johnson-Kendall-Roberts (JKR) adhesion model is use d and the procedure for analyzing the particle pull-off force is descr ibed. The theory of critical moment, in addition to the sliding and li fting detachment models, is used, and the critical substrate accelerat ions for particle removal are evaluated and discussed. The model predi ctions for aluminum and glass particles are also compared with the exp erimental data and reasonable agreement is observed. The application o f the results to surface-cleaning equipment is discussed.