AUGER LINESHAPE MODULATION BY SCATTERING-INTERFERENCE OF PRIMARY ELECTRONS

The electron-excited P LVV Auger lineshape has been investigated as a function of the beam incidence angle. The crystalline effects on the o utgoing Auger electrons are avoided by using an angle-integrated elect ron analyser (CMA). Auger signal intensity as well as lineshape change s are observed on varying the beam incidence angle. The experimental r esults have been explained in terms of the angular dependence of the i ntensity and anisotropy of background, Auger signals from surface and bulk and their plasmon losses.