LOW-TEMPERATURE CHEMICAL-VAPOR-DEPOSITION OF SILVER ON AG(111) USING ((CH3)(3)CCOCHCOC3F7)AGPET(3)

The adsorption of 1,1,1,2,2,3,3-heptafluoro-7,7-dimethyl-4, (fodH) and hyl-4,6-octanedionato)(triethylphosphine)silver(I) ((fod)AgPEt(3)) on Ag(III) has been studied using reflection absorption infrared spectro scopy and temperature programmed desorption techniques. fodH adsorbs m olecularly in two adsorbed states. The first state adsorbs with its mo lecular plane parallel to the surface and desorbs at 250 g. The second adsorbed state is the condensed phase which desorbs at 197 K. The mos t interesting result of this work is that, at the lowest coverages, th e first (fod)AgPEt(3) molecules adsorb parallel to the Ag(III) surface and dissociate at very low temperature. For higher doses, (fod)AgPEt( 3) molecules are randomly oriented at low temperature. Upon heating of the sample, these molecules reorient their molecular plane to a posit ion nearly perpendicular to the Ag(III) surface before their desorptio n at 290 K. The desorbing byproducts resulting from the dissociation o f the flat-laying molecules are fodH at 200 K, CH4 at 140 K, and PEt(3 ) at 135 and 170 K. At high temperature the desorption of HF was obser ved at 490 K and CO2 around 600 K. The desorption of C3F7 and C4H9 rad icals was also detected at this temperature.