LASER-INDUCED SELECTIVE DEPOSITION OF NI-P ALLOY ON SILICON

Selective deposition of Ni-P alloy thin film on p-type silicon was obt ained in a hypophosphite-based conventional electroless nickel plating solution at ambient temperature under laser irradiation. Composition and properties of the deposits were investigated using SEM, XPS, AES a nd RBS techniques. The presence of HF and a sufficient power density a re necessary for deposition of a detectable film. Crystalline Ni-P all oy deposits are formed and a diffusion of elements at the interface is found. The mechanism involved in the deposition process is also discu ssed. The Ni-P deposits are in Schottky barrier contact with p-type si licon.