Sy. Shiryaev et al., NANOSCALE STRUCTURING BY MISFIT DISLOCATIONS IN SI1-XGEX SI - EPITAXIAL SYSTEMS/, Physical review letters, 78(3), 1997, pp. 503-506
New capabilities of misfit dislocations for spatial manipulation of is
lands in Si1-xGex/Si heteroepitaxial systems have been elucidated. For
mation of highly ordered Ge-island patterns on substrates prestructure
d by slip bands of misfit dislocations is revealed. The major sources
leading to the ordering are identified to be dislocation strain fields
at the surface and modifications of the nearsurface-layer morphology
induced by dislocation slip.