IN-SITU OBSERVATIONS OF THE INITIAL-STAGE OF ELECTRODEPOSITION OF CU ON AU(100) FROM AN AQUEOUS SULFURIC-ACID-SOLUTION USING ATOMIC-FORCE MICROSCOPY

We have investigated the atomic structures of underpotentially deposit ed (UPD) Cu adlayers as well as nucleation and growth mechanisms of bu lk Cu deposition on Au(100) from an aqueous sulfuric acid solution usi ng in situ electrochemical atomic force microscopy (ECAFM). The pseudo morphic Cu(1 x 1) layer on Au(100) is formed for a first full monolaye r in the presence and absence of Cl-. We have found that the completio n of the UPD monolayer is followed by an ideal layer-by-layer bulk Cu deposition (Frank-van der Merwe mode) at a low overpotential range.