ONIUM SALTS AS RADIATION-SENSITIVE ACID GENERATORS FOR RESISTS WITH CHEMICAL AMPLIFICATION (REVIEW)

The necessity of mastering alternative lithographic processes for deve lopment and production of 64 and 256 Mbit dynamic random-access memory units has been substantiated. It is shown that conventional positive photoresists based on diazonaphthoquinone and novolac resins do not me et the requirements of modern microlithography. The concept of chemica l amplification offered a means for developing adequate topological st ructures with sizes of resist components of 0.35 mu m or less. Onium s alts are universal and efficient acid generators for resists with chem ical amplification. Studies in the field of photo- and radiochemistry of onium salts have been summarized and correlated. It has been shown that the quantum yield and distribution of photolysis products are gov erned to a major extent by geminal and bulk recombination. Specific fe atures of photolysis and radiolysis of onium salts in a polymer matric are considered.