In order to gain an insight into the process of RF styrene plasma, the
gas phase plasmas were investigated by emission spectroscopy. The pla
sma reactor was a bell-jar-type chamber with two parallel plate electr
odes. The measurement of plasma emission spectra was made with axial r
esolution, The correlations among the emission intensities of CH and C
4H2+ species, the polymer deposition rate and the polymeric structure
of the deposited films were studied. The proposed analysis showed that
the gas how pattern in the plasma reactor, and the difference in coll
isions between styrene monomer molecules and energetic free electrons
occurring in plasma region and RF sheath, made the fragments and ions
produced thereof change in the different regions, resulting in the cha
nge in polymeric structure and deposition rate of the polymer films. W
ith the increase in distance between the substrate position and the lo
wer electrode, the deposition rate and the concentration of phenyl gro
ups both at the polymer surface and in the bulk decreased.