INVESTIGATION ON RF STYRENE PLASMA BY EMISSION-SPECTROSCOPY

Authors
Citation
M. Chen et al., INVESTIGATION ON RF STYRENE PLASMA BY EMISSION-SPECTROSCOPY, IEEE transactions on plasma science, 23(2), 1995, pp. 151-155
Citations number
12
Categorie Soggetti
Phsycs, Fluid & Plasmas
ISSN journal
00933813
Volume
23
Issue
2
Year of publication
1995
Pages
151 - 155
Database
ISI
SICI code
0093-3813(1995)23:2<151:IORSPB>2.0.ZU;2-I
Abstract
In order to gain an insight into the process of RF styrene plasma, the gas phase plasmas were investigated by emission spectroscopy. The pla sma reactor was a bell-jar-type chamber with two parallel plate electr odes. The measurement of plasma emission spectra was made with axial r esolution, The correlations among the emission intensities of CH and C 4H2+ species, the polymer deposition rate and the polymeric structure of the deposited films were studied. The proposed analysis showed that the gas how pattern in the plasma reactor, and the difference in coll isions between styrene monomer molecules and energetic free electrons occurring in plasma region and RF sheath, made the fragments and ions produced thereof change in the different regions, resulting in the cha nge in polymeric structure and deposition rate of the polymer films. W ith the increase in distance between the substrate position and the lo wer electrode, the deposition rate and the concentration of phenyl gro ups both at the polymer surface and in the bulk decreased.