L. Lechevallier et al., IN-SITU SURVEY SYSTEM OF RESISTIVE AND THERMOELECTRIC PROPERTIES OF EITHER PURE OR MIXED MATERIALS IN THIN-FILMS EVAPORATED UNDER ULTRA-HIGH-VACUUM, Journal de physique. III, 5(4), 1995, pp. 409-418
Citations number
18
Categorie Soggetti
Material Science","Phsycs, Fluid & Plasmas","Physics, Applied
The study of thermoelectric and resistive in situ behaviours depending
on temperature for thin films of either pure or composite materials o
btained under ultra-high vacuum, is very interesting, since they can b
e used as strain gauges or superficial resistances. However, studies b
ecome particularly difficult when the measurements generate very low-l
evel electrical signals. Indeed, these turn out to be hardly detectabl
e because of the perturbations brought by the experimental environment
. The apparatus described below allows for the measurement of resistan
ce with a relative uncertainty of 2 x 10(-4), resistance variation wit
h an absolute uncertainty of 2 m Omega and thermoelectric e.m.f. of ab
out 2 mu V Films studied in the laboratory generally exhibit resistanc
es lower than 100 Omega and resistance variations due to temperature v
ariations of about a few ohms. So this device has sufficient technical
characteristics for our studies. It can be connected to a PC, which a
llows for easy data collection and treatment.