Ig. Gorichev et al., KINETICS OF COPPER(II) OXIDE DISSOLUTION - THE INFLUENCE OF THE ELECTRICAL DOUBLE-LAYER, Russian journal of electrochemistry, 31(3), 1995, pp. 266-276
The influence of solution pH, solution composition, and the nature of
several chelating agents on the dissolution of copper(II) oxide is inv
estigated. It is shown that changes in order of the oxide dissolution
rate with pH as well as the effect of the medium redox potential and t
he chelating agent nature on the dissolution process may be explained
in light of the concepts on the structure of the ionic part of the ele
ctrical double layer at the oxide-electrolyte interface. A mechanism f
or the dissolution of copper(II) oxides in the presence of chelating a
gents is proposed.