ARSENIC LEVELS IN HAIR OF WORKERS IN A SEMICONDUCTOR FABRICATION FACILITY

Citation
A. Depeyster et Ja. Silvers, ARSENIC LEVELS IN HAIR OF WORKERS IN A SEMICONDUCTOR FABRICATION FACILITY, American Industrial Hygiene Association journal, 56(4), 1995, pp. 377-383
Citations number
21
Categorie Soggetti
Public, Environmental & Occupation Heath
ISSN journal
00028894
Volume
56
Issue
4
Year of publication
1995
Pages
377 - 383
Database
ISI
SICI code
0002-8894(1995)56:4<377:ALIHOW>2.0.ZU;2-X
Abstract
This study examined the relationship between total arsenic levels in h air of employees in a semiconductor fabrication facility and job respo nsibility, a surrogate variable for arsenic exposure potential. Mainte nance personnel who regularly worked in equipment cleaning areas were assumed to have higher potential for occupational exposure than other employees. Occipital scalp hair samples were collected from 30 mainten ance personnel, supervisors, and equipment engineers with high, medium , and low potential for exposure and from 26 administrative employees. Total arsenic in hair was measured by atomic absorption spectroscopy with hydride generation. Workplace air and wipe samples were analyzed to verify differing exposure potential in fabrication and administrati ve areas. Subjects completed written questionnaires to identify possib le nonoccupational sources of arsenic. Mean hair arsenic in two of the three groups working in or near fabrication areas was slightly higher but not statistically different from that of administrative controls. Eliminating smokers, only the maintenance group regularly assigned to fabrication areas was higher than administrative controls but still n ot statistically different. A regression analyst of all factors indica ted that sex tapwater consumption, and dietary habits were significant contributors to arsenic in hair. Trends among these groups were consi stent with expected exposure potential, although not dramatically diff erent from controls. Main study conclusions were that (1) nonoccupatio nal sources of arsenic can be expected to contribute more to hair leve ls in employees than that observed in this particular semiconductor wo rk environment, where safe work practices were believed to be followed ; and (2) monitoring should be considered in this industry to identify employees experiencing chronic, low-level arsenic exposures only if t he facility also examines nonoccupational sources of exposure. Further study is needed to correlate hair arsenic level with internal body bu rden of those species of arsenic primarily responsible for its toxic e ffects.