A novel HEMT layout with ringshaped gate is reported. This conception
avoids the problems related to mesa etching at the active region and p
rovides additional possibilities for circuit design. The layer structu
re of the investigated device is based on an Al-free InP/InGaAs materi
al system. Transistors with a gate length of 0.7 mu m show an f(T) of
40GHz and an f(max) of 117GHz. These values are similar to results obt
ained with the conventional HEMT design.