Si. Kshnyakina et Vm. Ignatenko, INVESTIGATION OF OPTICAL-PROPERTIES OF TH IN VANADIUM DIOXIDE FILMS AT THE METAL-SEMICONDUCTOR PHASE-TRANSITION BY ELLIPSOMETRY, UKRAINSKII FIZICHESKII ZHURNAL, 39(3-4), 1994, pp. 416-419
The ellipsometry is used to study optical properties of thin vanadium
dioxide films on mono- and polycrystal vanadium substrates for a metal
- semiconductor transition. The measurements were carried out in the
temperature range from 295 to 395 K. It is noted that there is an incr
ease in a film thickness at the phase transition.