It is shown that thermo-annealing of oxygen-containing silicon crystal
s of both n- and p-type in the temperature interval from 450 to 1100 d
egrees C leads to appearance of two additional scattering mechanisms,
i.e., scattering on oxygen precipitates as well as scattering on space
charge regions which are formed due to a nonuniform overcompensation
of p-type Si into n-type induced by thermodonors. The latter mechanism
is characteristic For p-type silicon only.