NICKEL SILICIDE FORMATION IN SILICON IMPLANTED NICKEL

Authors
RAO Z WILLIAMS JS POGANY AP SOOD DK COLLINS GA
Citation
Z. Rao et al., NICKEL SILICIDE FORMATION IN SILICON IMPLANTED NICKEL, Journal of applied physics, 77(8), 1995, pp. 3782-3790
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
77
Issue
8
Year of publication
1995
Pages
3782 - 3790
Database
ISI
SICI code
0021-8979(1995)77:8<3782:NSFISI>2.0.ZU;2-Z