H. Hoffmann et al., STRUCTURE OF ALKYLSILOXANE MONOLAYERS ON SILICON SURFACES INVESTIGATED BY EXTERNAL REFLECTION INFRARED-SPECTROSCOPY, Langmuir, 11(4), 1995, pp. 1304-1312
Self-assembled monolayers of homologous alkyltrichlorosilanes (CH3(CH2
)(n)SiCl3, n = 10, 13-17) on bulk silicon substrates have been prepare
d by adsorption from dilute solutions under dry inert gas conditions a
nd the hydrocarbon chain orientation in the monolayer films has been i
nvestigated by external reflection infrared spectroscopy. A quantitati
ve analysis of the monolayer reflection spectra based on a spectral si
mulation and fit procedure reveals that the hydrocarbon chains in thes
e monolayers are tilted by an average of 8 degrees toward the surface
normal. A linear relationship was found between the hydrocarbon chain
length of the adsorbate molecules and the nu(CH2) absorption intensiti
es in the monolayer reflection spectra, which further supports an esse
ntial conservation of an ordered film structure with a constant chain
tilt angle within this series of adsorbate compounds. A slight increas
e of structural disorder with decreasing chain length was indicated, h
owever, by peak shifts and band broadenings of the CH stretching absor
ptions and has been ascribed to an increased amount of conformationall
y disordered hydrocarbon chains. Significant changes in the film struc
ture were observed for monolayers of short-chain compounds (n = 10, n
= 13) prepared under ambient atmospheric conditions. The films consist
of isotropically disordered, liquid-like regions and ordered, crystal
line domains. The long-chain compounds, on the other hand, yielded ide
ntical film structures under both atmospheric and dry inert gas condit
ions.