In this review the role of stress in the high temperature oxidation of
metals is examined. In the introductory sections the Wagner theory of
oxide growth and its modification to account for short circuit diffus
ion are outlined. The direct influence of oxide growth stresses on def
ect diffusion is then examined and shown to be a significant factor wh
en constrained volume changes accompany the growth of the oxide layer.
Methods for evaluating growth stresses are critically reviewed and th
e possible origins of such stresses considered in detail. The response
of the oxide layer to thermally and mechanically induced stresses is
considered in the last part of the review. Under tensile conditions, t
hrough-thickness cracks can readily be produced but may also heal with
fresh oxide if imposed strain rates are relatively low. Spallation of
the oxide is not usually found under tensile conditions but occurs fr
equently under compressive stresses by either a 'buckling' or 'wedging
' process. Detailed descriptions of these are provided and their use a
s the basis of spallation maps is described.